Application-specific filtration solutions for ultrapure water, wet processing, chemical distribution, electroplating, CMP slurry, advanced packaging, and hard-disk media manufacturing.
Microelectronics and semiconductor manufacturing depend on carefully controlled process fluids. Particles, agglomerates, metallic contaminants, and filter-generated extractables can affect surface preparation, coating uniformity, equipment performance, and finished-product quality.
Strainrite works with customers to understand the fluid, contaminant, operating conditions, and required filtration result before recommending a solution. Our membrane cartridges, depth filters, high-efficiency filter bags, and capsules support applications throughout microelectronics manufacturing.
01
Ultrapure and deionized water are used throughout semiconductor manufacturing for chemical blending, rinsing, surface preparation, and equipment cleaning. Filtration may be required at multiple stages, from protecting reverse-osmosis equipment to final polishing and point-of-use delivery.
Poly-MAXX / Pur-Pleat polypropylene depth cartridges provide upstream particulate removal and help protect downstream membranes and water-treatment equipment. For finer retention in high-purity water and point-of-use applications, PES-E polyethersulfone membrane cartridges offer a hydrophilic membrane configuration developed for microelectronics processing.
02
Wet etch, cleaning, and chemical-distribution processes use water, acids, bases, solvents, and other chemistries to prepare wafer and component surfaces. Effective filtration helps control particles without introducing unwanted contamination or unnecessarily restricting process flow.
Depending on the chemistry and operating conditions, Strainrite solutions may include Mem-Pleat T / Pur-MAXX T PTFE cartridges for aggressive chemicals and solvents, Mem-Pleat N / Pur-MAXX N nylon cartridges for compatible process chemistries, and Mem-Pleat
CN / Pur-MAXX CN charged nylon cartridges for applications that benefit from charge-enhanced particle retention.
Small-volume processing, sampling, and development applications may also be supported by MAXX-Cap and Brevi-Cap disposable capsule filters.
03
Electroless and electrochemical deposition processes rely on controlled plating solutions to produce consistent surface finishes and deposits. Suspended particles and unwanted contaminants can contribute to surface imperfections, inclusions, and inconsistent plating results.
Strainrite offers membrane and depth-cartridge options for recirculated plating baths, chemical makeup systems, and point-of-use delivery. Depending on the plating chemistry and filtration objective, potential solutions may include Mem-Pleat E / Pur-MAXX E polyethersulfone, Mem-Pleat N / Pur-MAXX N nylon, or an application-compatible Strainrite depth cartridge.
Product selection should account for the plating chemistry, contaminant profile, desired retention, flow requirements, bath conditions, and potential interaction between the filter and process additives.
04
Chemical mechanical planarization slurries contain intentionally engineered abrasive particles. Filtration must remove oversized particles, gels, and agglomerates without unnecessarily changing the slurry’s functional particle distribution.
For bulk-chemical handling and upstream slurry filtration, potential Strainrite solutions include SPMF high-efficiency polypropylene filter bags, Accu-Rite absolute-rated filter bags, and application-compatible polypropylene depth cartridges.
05
Strainrite has extensive filtration experience in hard-disk media manufacturing, where particle control supports surface preparation, plating, washing, lubrication, and final component quality.
Applications include electroless nickel plating, pre-sputter etch and cleaning, post-polish and post-sputter washing, DI-water filtration, disk-lubrication filtration, and final component washing.
Depending on the process fluid, potential solutions include PESE-E or Mem-Pleat E / Pur-MAXX E polyethersulfone cartridges for compatible aqueous applications, Mem-Pleat T / Pur-MAXX T PTFE cartridges for compatible solvents and aggressive chemistries, and Mem-Pleat N / Pur-MAXX N nylon cartridges for selected reagent and process-chemical applications.
Ultrapure Water and DI-Water Systems
Wet Processing and Chemical Distribution
Electroplating and ECD Filtration
Microelectronics fabrication environments demand filtration equipment that contributes zero contamination to the process stream. At advanced nodes (3nm and below), critical particle sizes approach 10–15 nanometers—below the detection limit of conventional liquid particle counters. Strainrite’s microelectronics-grade products are manufactured with materials that meet USP Class VI biological reactivity requirements for ultra-low extractables and volatiles.
Strainrite manufactures filtration products under an ISO 9001-certified quality-management system. Product-specific quality controls may include incoming-material inspection, in-process verification, final inspection, integrity testing, and flushing.
Select microelectronics and high-purity product families are available with application-specific construction, cleanliness features, and supporting documentation. Available testing, flushing procedures, and documentation depend on the product and configuration and should be confirmed during product selection.
PES-E Polyethersulfone Membrane Cartridges
Purpose-built for microelectronics; 50–1200nm absolute retention; hydrophilic asymmetric PES membrane; 18 megohm DI flushed; double rinse process; USP Class VI; 100% integrity tested; Electronics (E) grade; broad chemical compatibility for UPW, high-purity chemicals, and DI water systems.
Mem-Pleat S & Pur-MAXX S Polysulfone Membrane Cartridges
0.03–0.65µm absolute retention; high-purity aqueous chemical filtration; DI water point-of-use and pre/post filter applications; available with DI flush option.
Mem-Pleat T & Pur-MAXX T PTFE Membrane Cartridges
0.1–0.2µm absolute retention; hot deionized water, photoresists, and electronic-grade solvents; full fluoropolymer chemical resistance for aggressive wet etch and clean processes.
Mem-Pleat E & Pur-MAXX E Polyethersulfone Membrane Cartridges
0.04–1.2µm absolute retention; deionized water systems and general high-purity water filtration; low extractables and integrity tested.
Mem-Pleat CN & Pur-MAXX CN Charged Nylon Membrane Cartridges
0.04–1.2µm retention with positive zeta potential for electrostatic removal of silica colloids, fine particles, and negatively charged contaminants below rated pore size; reagent-grade chemical filtration.
Mem-Pleat N & Pur-MAXX N Nylon 6,6 Membrane Cartridges
0.1–1.2µm absolute retention; fine chemicals and reagent-grade chemicals; no additives, resins, or surfactants.
Pur-Pleat & Poly-MAXX Absolute-Rated Polypropylene Depth Cartridges
1–70µm; RO/DI prefiltration; USP Class VI; all-polypropylene construction for chemical compatibility.
SPMF High-Efficiency Filter Bags
1–25µm absolute; all-polypropylene; FDA/EC listed; bulk chemical handling and plating bath prefiltration.
SPMF High-Efficiency Filter Bags
1–25µm absolute; all-polypropylene; FDA/EC listed; bulk chemical handling and plating bath prefiltration.
Accurite Ultra-Efficient Filter Bags
1.5–25µm absolute; polypropylene support; microelectronics and high-purity process applications.
SRC Industrial-Duty Cartridge Vessels
High-purity vessel option for Clarity and membrane cartridge housings.
SRCT Sanitary Cartridge Vessels — Sanitary
grade vessels for pharmaceutical and semiconductor-grade cartridge applications.
Downloadable PDF
Microelectronics & Semiconductor Filtration Selection Guide — Recommended filter media, micron ratings, and cartridge/bag configurations for UPW, chemical distribution, wet etch, CMP, ECD plating, and HDD manufacturing applications.
Downloadable PDF
Microelectronics-Grade Membrane Cartridge Data Sheet — Complete specifications including retention ratings, chemical compatibility, extractables data, DI flush protocols, and ordering information for Strainrite’s purpose-built semiconductor filtration cartridge.
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